Introduction

The micro/nano fabrication laboratory mainly meets the necessary requirements of fabricating micro/nano-structures and devices for the users and systems of Synergetic Extreme Condition User Facility. The laboratory contains class 100 clean rooms and class 1000 clean rooms, where the class 100 clean rooms are yellow light areas, which can be used for lithography, developing and resist coating in different ways. And the class 1000 clean rooms are divided into 8 functional areas, which can be used for the lithography, deposition, etching and other fabricating processes of various materials, as well as the characterization of micro/nano- structures and the physical properties testing. The main fabrication process indexes of the micro/nano fabrication laboratory are listed as follows: the minimum line width of electron beam lithography of 8 nm, the minimum line width of the UV lithography of 0.5 μm, the resolution of laser direct writing of 600 nm, the minimum line width of Si etching of 30 nm, the highest aspect ratio of Si etching of 30:1, and the slope angle of etching side wall of Si can be adjusted from 85° to 92°.

There are 43 sets of instruments and equipment in the micro/nano fabrication laboratory, including 4 lithography equipment, 9 deposition equipment, 9 etching equipment, 10 characterization equipment and 11 auxiliary equipment. 

Parameter

Contact

Ruhao Pan, E-mail: panruhao@iphy.ac.cn