1B3 is beamline for lithography and locates at No.13 experimental hall. It provides deep X-ray lithography and nano X-ray lithography. The alternation between deep and nano X-ray lithography is achieved by a mirror with 60nm-thick chromium film. The PMMA structure as deep as 1.5mm is achieved with deep X-ray lithography mainly working at 4 keV after a 300μm-thick Be window. Hundreds of nanometer structure is achieved with nano X-ray lithography mainly working at 1.5 keV after the Cr mirror and a 0.5μm-thick Si3N4 filter. The station could run both in the dedicated mode of synchrotron radiation and parasitic mode.

Supported techniques:

deep X-ray lithography

nano X-ray lithography

Beamline equipments

1000-superclean lab (300m2), 100-superclean lab (10m2)

Ultrapure water equipment

Rusty lab

Minor handicraft lab

Vacuum coating

Plating machine

Extreme ultra violet lithography

Double-sided alignment lithography machine

Reactive Ion Etching

Scanning electron microscope

Microscope

Beamline Specs       　　  

Source                                BM  

Energy Range                   1.5keV, 4 keV